• 尊龙凯时人生需要博

      The Prismo HiT3® system is engineered to mass produce deep UV LEDs with excellent process performance. It enables the growth of high-quality aluminum nitride and high-aluminum component materials. With a maximum reactor chamber temperature of 1400 Celsius degrees, the system can process up to 18 2-inch epitaxial wafers per run, with extendibility to 4-inch wafers, making it one of the highest throughput advanced tool of its kind in the industry.

      Prismo HiT3®

      MOCVD solution for deep UV LED mass production

      Products Features

      Enabling technology to grow high temperature AIN and UVC LEDs

      Excellent epi yield, with industry-leading efficiency and uniformity

      Novel design features for high quality and high AlN growth rate

      Innovative in-situ, real-time monitoring system

      Process temperature up to 1400℃ with excellent temperature uniformity and stability

      Highly stable and automatic vacuum transfer to prevent particle generation

      Fully automatic process with user-friendly interface

      Competitive Advantages

      Superb process performance, simplified process adjustment and improved production yield

      Up to 18x2” epitaxial wafers per run with low production cost

      Integrated lid lifting mechanism, simplified tool maintenance and improved equipment utilization

      Superior